Liabilities / Assets
94th percentile
Higher debt load relative to assets than 94% of similar nonprofits.
Precomputed percentiles for this filing year versus similar nonprofits in the same peer cohort.
Liabilities / Assets
94th percentile
Higher debt load relative to assets than 94% of similar nonprofits.
Liabilities / Revenue
51st percentile
Higher debt load relative to revenue than 51% of similar nonprofits.
Net Margin
59th percentile
Higher net margin than 59% of similar nonprofits.
Top Officer Pay
84th percentile
Higher top officer pay than 84% of similar nonprofits.
Top officer pay equals 1.4% of source-year revenue.
Asset Growth
1st percentile
Faster asset growth than 1% of similar nonprofits.
Revenue Growth
6th percentile
Faster revenue growth than 6% of similar nonprofits.
Assets
Down$19,894,664
Down $14,239,557 (-42%) from 2013
Net Assets
Up$79,360
Up $4,226,097 (+102%) from 2013
Liabilities
Down$19,815,304
Down $18,465,654 (-48%) from 2013
Revenue
Down$48,632,125
Down $31,171,661 (-39%) from 2013
Expenses
Down$44,411,028
Down $45,523,379 (-51%) from 2013
Net Income
Up$4,221,097
Up $14,351,718 (+142%) from 2013
To advance the state of the art of semiconductor chip manufacturing and related technologies. We do this by fostering, performing and sponsoring research and development at multiple levels of the semiconductor and nanotechnology supply chain. We collaborate with members, non-members and other academic or research institutions to promulgate new technological developments in fabrication processes, equipment, materials and applications. Except for proprietary info of our collaborators protected by confidentiality agreements, we strive to publicize our research and development results through publications in scientific journals, participation in industry conferences and sematech sponsored or organized workshops and symposia. By making leading-edge process capabilities, scientific and technical expertise and laboratory facilities available to existing semiconductor industry participants and prospective new entrants, we spur innovation, support competition and improve access to technology.
Sematech's mission is to cooperatively set global industry direction and accelerate technology solutions in infrastructure, lithography, materials and manufacturing, to ensure a strong and vibrant semiconductor industry. A principal means by which sematech achieves its mission is to fund research and development contracts in the various areas of advanced semiconductor technology.
| Line | Beginning | End | Change |
|---|---|---|---|
| Assets | |||
| Cash and Non-Interest-Bearing Accounts | $11,436,116 | $10,418,712 | ▼ $1,017,404 |
| Savings and Temporary Cash Investments | $2,787,380 | $4,392,489 | ▲ $1,605,109 |
| Land, Buildings, and Equipment, Net | $3,769,819 | $2,070,841 | ▼ $1,698,978 |
| Accounts Receivable | $1,764,652 | $1,477,809 | ▼ $286,843 |
| Investments in Publicly Traded Securities | $1,163,854 | $953,688 | ▼ $210,166 |
| Prepaid Expenses and Deferred Charges | $515,862 | $281,125 | ▼ $234,737 |
| Total Assets | $34,134,221 | $19,894,664 | ▼ $14,239,557 |
| Other Assets Total | $12,696,538 | $300,000 | ▼ $12,396,538 |
| Liabilities | |||
| Deferred Revenue | $12,904,109 | $12,375,218 | ▼ $528,891 |
| Other Liabilities | $18,554,846 | $3,728,982 | ▼ $14,825,864 |
| Accounts Payable and Accrued Expenses | $6,822,003 | $3,711,104 | ▼ $3,110,899 |
| Total Liabilities | $38,280,958 | $19,815,304 | ▼ $18,465,654 |
| Net Assets / Fund Balance | |||
| Temporarily Rstr Net Assets | $600,000 | $300,000 | ▼ $300,000 |
| Unrestricted Net Assets | $-4,746,737 | $-220,640 | ▲ $4,526,097 |
| Total Net Assets Fund Balance | $-4,146,737 | $79,360 | ▲ $4,226,097 |
| Total Liabilities and Net Assets / Fund Balance | $34,134,221 | $19,894,664 | ▼ $14,239,557 |
| Asset | Book Value | Depreciation | Basis |
|---|---|---|---|
| Equipment | $1,604,841 | $2,719,802 | $4,324,643 |
| Buildings | $466,000 | - | - |
| Name | Title | Full / Part Time | Base | Other | Total |
|---|---|---|---|---|---|
| Armbrust Daniel J | Past President and CEO | FT | $186,729 | $476,409 | $663,138 |
| Saathoff David D | Past Senior Vice President & CAO | FT | $157,246 | $502,940 | $660,186 |
| Goldblatt Ronald | President and CEO | FT | $303,996 | $112,468 | $416,464 |
| Barfield Randall | VP Finance and Administration | FT | $230,561 | $51,902 | $282,463 |
| Holladay Dan | Past Director Adv Tech/pv Program | FT | $128,303 | $107,109 | $235,412 |
| Hobbs Christopher C | Adanced Processed Materials & Esh Mgr | FT | $183,444 | $31,771 | $215,215 |
| Hobbs Christopher C | Adanced Processed Materials & Esh Mg | - | $154,818 | $60,397 | $215,215 |
| Goodwin Francis G | Program Manager | FT | $169,838 | $45,138 | $214,976 |
| Mcwilliams Scott | Staff Solar Technologist | FT | $176,554 | $37,216 | $213,770 |
| Barth Edward | Director Strategic Growth Initiatives | FT | $179,729 | $27,168 | $206,897 |
| Barth Edward | Director Strategic Growth Initiative | - | $159,194 | $47,703 | $206,897 |
| Rozich Bill | Chairman | - | $30,000 | - | $30,000 |
| Name | Title |
|---|---|
| Bennett David | Director |
| Cadigan Michael | Director |
| Johnston Steven | Director |
| Kaloyeros Alain | Director |
| Kang Ho-kyu | Director |
| Liehr Michael | Director |
| Hanson Scott | General Counsel |
| Contractor | Services | Location | Compensation |
|---|---|---|---|
| Carl Zeiss Jenna Gmbh | Euv Mask Metrology Tool Development | 1 CYCLOTRON RD, Berkeley, CA 94720-0001, Gm | $6,482,446 |
| Lawrence Berkeley Laboratory | Euv Met And Sharp Operations & Tool Deve | PO BOX 1253, Research Triangle Park, NC 22709 | $5,008,147 |
| Semiconductor Research Corp | University Semiconductor Research | 4401 FRIEDRICH LN, Austin, TX 78744-1810 | $1,825,776 |
| Asml | Euv Met Tool Development | STATE UNIVERSITY OF NEW YORK, Albany, NY 12203-3652 | $1,753,290 |
| The Research Foundation | University Semiconductor Research | - | $1,169,640 |
| Line Item | Amount |
|---|---|
| Other Expenses | $37,635,467 |
| Salaries, Compensation, and Employee Benefits | $6,775,561 |
| Grants and Similar Amounts Paid | $0 |
| Professional Fundraising Fees | $0 |
| Total Fundraising Expense | $0 |
| Line Item | Program | Management | Fundraising | Total |
|---|---|---|---|---|
| All Other Expenses | - | - | - | $4,522,450 |
| Other Expenses | - | - | - | $3,812,317 |
| Other Salaries and Wages | - | - | - | $2,265,147 |
| Current Officers, Directors, Trustees, and Key Employees | - | - | - | $1,949,435 |
| Fees for Services Other | - | - | - | $1,647,529 |
| Other Employee Benefits | - | - | - | $1,296,193 |
| Travel | - | - | - | $910,619 |
| Conferences and Meetings | - | - | - | $860,770 |
| Depreciation Depletion | - | - | - | $822,815 |
| Information Technology | - | - | - | $645,927 |
| Pension Plan Contributions | - | - | - | $634,793 |
| Payroll Taxes | - | - | - | $629,993 |
| Insurance | - | - | - | $190,309 |
| Office Expenses | - | - | - | $146,042 |
| Interest | - | - | - | $70,744 |
| Advertising | - | - | - | $1,819 |
| Total Functional Expenses | $0 | $0 | $0 | $44,411,028 |
| Region | Activity | Services | Offices | Employees | Spending |
|---|---|---|---|---|---|
| East Asia and the Pacific | Program Service | Member Marketing and Relationship Management | 2 | 0 | - |
| East Asia and the Pacific | Program Service Revenue | Membership Dues Received From Members in the Region | 0 | 0 | - |
| Europe | Program Service Revenue | Membership Dues Received From Members in the Region | 0 | 0 | - |
| Middle East and North Africa | Program Service Revenue | Membership Dues Received From Members in the Region | 0 | 0 | - |
| Line Item | Amount |
|---|---|
| Professional Fundraising Fees | $0 |
| Liability | Amount |
|---|---|
| Capital Lease | $2,382,004 |
| Deferred Compensation | $953,688 |
| Member and Participant Payables | $393,290 |
“Sematech is a membership corporation. As such, it is owned by its members.”
“Per the terms of their membership agreements, each member is allowed one voting member on sematech's board of directors, so each member has a voting director on the board of directors. Also, the research foundation of cnse and fuller road mgmt corp (representing suny) each have a representative on the board of directors. Finally sematech's ceo is also a voting member of the board of directors. The chairman of the board of directors is not allowed to vote.”
“Sematech's board of directors has a compensation committee and an audit and finance committee (and in certain instances, special committees are formed -e.g., to search for a new ceo). Historically, these committees have not kept minutes of their meetings. The audit & finance committee typically meets just before a regularly scheduled board meeting. The chair of the committee then reports to the board on the outcome of the committee meeting and the minutes of the board meeting reflect that committee report. The compensation committee sets performance goals, conducts performance reviews and decides salary and bonus levels for executive management. Details of these matters are best recorded in the confidential personnel files of the individuals involved, rather than in meeting minutes.”
“Sematech's 990 is reviewed by the cfo with input from staff.”
“The ceo's pay is benchmarked by the director of human resources and reviewed and approved by the chairman and compensation committee. All other key employees are benchmarked by human resources and reviewed and approved by the ceo.”
“Governing documents, conflict of interest policy, and financial statements are not made available to the public.”
“Wafer processing services 3,027,116. Impairment loss 875,816. Recruiting & relocation 619,518.”
“Eliminate investment in subsidiary that no longer exists 5,000.”
“The process of selecting an independent accountant and oversight of the audit of the financial statements has not changed from prior years.”
“The company follows the guidance for uncertainty in income taxes. As of december 31, 2014, the company believes that it has appropriate support for the income tax positions taken and to be taken on its returns based on an assessment of many factors including experience and interpretations of tax laws applied to the facts of each matter. The company has concluded that there are no significant uncertain tax positions requiring disclosure, and there are no material amounts of unrecognized tax benefits. The company is no longer subject to federal, state, or local income tax examination by tax authorities for years before 2011.”
This appendix keeps the raw XML leaves available for debugging and edge-case review. The human report above is the primary experience.
| Path | # | Value |
|---|---|---|
| IRS990/AccountantCompileOrReviewInd | 0 | 0 |
| IRS990/AccountsPayableAccrExpnssGrp/BOYAmt | 0 | 6822003 |
| IRS990/AccountsPayableAccrExpnssGrp/EOYAmt | 0 | 3711104 |
| IRS990/AccountsReceivableGrp/BOYAmt | 0 | 1764652 |
| IRS990/AccountsReceivableGrp/EOYAmt | 0 | 1477809 |
| IRS990/ActivitiesConductedPrtshpInd | 0 | 0 |
| IRS990/ActivityOrMissionDesc | 0 | SEMATECH'S MISSION IS TO COOPERATIVELY SET GLOBAL INDUSTRY DIRECTION AND ACCELERATE TECHNOLOGY SOLUTIONS IN INFRASTRUCTURE, LITHOGRAPHY, MATERIALS AND MANUFACTURING, TO ENSURE A STRONG AND VIBRANT SEMICONDUCTOR INDUSTRY. A PRINCIPAL MEANS BY WHICH SEMATECH ACHIEVES ITS MISSION IS TO FUND RESEARCH AND DEVELOPMENT CONTRACTS IN THE VARIOUS AREAS OF ADVANCED SEMICONDUCTOR TECHNOLOGY. |
| IRS990/AdvertisingGrp/TotalAmt | 0 | 1819 |
| IRS990/AllOtherExpensesGrp/TotalAmt | 0 | 4522450 |
| IRS990/AnnualDisclosureCoveredPrsnInd | 0 | 0 |
| IRS990/AuditCommitteeInd | 0 | 1 |
| IRS990/BackupWthldComplianceInd | 0 | 1 |
| IRS990/BooksInCareOfDetail/PersonNm | 0 | PETER DIFONDI |
| IRS990/BooksInCareOfDetail/PhoneNum | 0 | 5186491000 |
| IRS990/BooksInCareOfDetail/USAddress/AddressLine1Txt | 0 | 257 FULLER ROAD NO 2200 |
| IRS990/BooksInCareOfDetail/USAddress/CityNm | 0 | ALBANY |
| IRS990/BooksInCareOfDetail/USAddress/StateAbbreviationCd | 0 | NY |
| IRS990/BooksInCareOfDetail/USAddress/ZIPCd | 0 | 122033652 |
| IRS990/BusinessRlnWithFamMemInd | 0 | 0 |
| IRS990/BusinessRlnWithOfficerEntInd | 0 | 0 |
| IRS990/BusinessRlnWithOrgMemInd | 0 | 0 |
| IRS990/CashNonInterestBearingGrp/BOYAmt | 0 | 11436116 |
| IRS990/CashNonInterestBearingGrp/EOYAmt | 0 | 10418712 |
| IRS990/ChangeToOrgDocumentsInd | 0 | 0 |
| IRS990/CntrctRcvdGreaterThan100KCnt | 0 | 32 |
| IRS990/CollectionsOfArtInd | 0 | 0 |
| IRS990/CompCurrentOfcrDirectorsGrp/TotalAmt | 0 | 1949435 |
| IRS990/CompensationFromOtherSrcsInd | 0 | 0 |
| IRS990/CompensationProcessCEOInd | 0 | 1 |
| IRS990/CompensationProcessOtherInd | 0 | 1 |
| IRS990/ConferencesMeetingsGrp/TotalAmt | 0 | 860770 |
| IRS990/ConflictOfInterestPolicyInd | 0 | 1 |
| IRS990/ConservationEasementsInd | 0 | 0 |
| IRS990/ConsolidatedAuditFinclStmtInd | 0 | 0 |
| IRS990/ContractorCompensationGrp/CompensationAmt | 0 | 6482446 |
| IRS990/ContractorCompensationGrp/CompensationAmt | 1 | 5008147 |
| IRS990/ContractorCompensationGrp/CompensationAmt | 2 | 1825776 |
| IRS990/ContractorCompensationGrp/CompensationAmt | 3 | 1753290 |
| IRS990/ContractorCompensationGrp/CompensationAmt | 4 | 1169640 |
| IRS990/ContractorCompensationGrp/ContractorAddress/ForeignAddress/AddressLine1Txt | 0 | RUDOLF-EBER-STRASE 2 |
| IRS990/ContractorCompensationGrp/ContractorAddress/ForeignAddress/CityNm | 0 | OBERKOCHEN |
| IRS990/ContractorCompensationGrp/ContractorAddress/ForeignAddress/CountryCd | 0 | GM |
| IRS990/ContractorCompensationGrp/ContractorAddress/ForeignAddress/ProvinceOrStateNm | 0 | 73447 |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/AddressLine1Txt | 0 | 1 CYCLOTRON RD |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/AddressLine1Txt | 1 | PO BOX 1253 |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/AddressLine1Txt | 2 | 4401 FRIEDRICH LN |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/AddressLine1Txt | 3 | STATE UNIVERSITY OF NEW YORK |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/CityNm | 0 | BERKELEY |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/CityNm | 1 | RESEARCH TRIANGLE PARK |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/CityNm | 2 | AUSTIN |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/CityNm | 3 | ALBANY |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/StateAbbreviationCd | 0 | CA |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/StateAbbreviationCd | 1 | NC |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/StateAbbreviationCd | 2 | TX |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/StateAbbreviationCd | 3 | NY |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/ZIPCd | 0 | 947200001 |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/ZIPCd | 1 | 22709 |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/ZIPCd | 2 | 787441810 |
| IRS990/ContractorCompensationGrp/ContractorAddress/USAddress/ZIPCd | 3 | 122033652 |
| IRS990/ContractorCompensationGrp/ContractorName/BusinessName/BusinessNameLine1Txt | 0 | CARL ZEISS JENNA GMBH |
| IRS990/ContractorCompensationGrp/ContractorName/BusinessName/BusinessNameLine1Txt | 1 | LAWRENCE BERKELEY LABORATORY |
| IRS990/ContractorCompensationGrp/ContractorName/BusinessName/BusinessNameLine1Txt | 2 | SEMICONDUCTOR RESEARCH CORP |
| IRS990/ContractorCompensationGrp/ContractorName/BusinessName/BusinessNameLine1Txt | 3 | ASML |
| IRS990/ContractorCompensationGrp/ContractorName/BusinessName/BusinessNameLine1Txt | 4 | THE RESEARCH FOUNDATION |
| IRS990/ContractorCompensationGrp/ServicesDesc | 0 | EUV MASK METROLOGY TOOL DEVELOPMENT |
| IRS990/ContractorCompensationGrp/ServicesDesc | 1 | EUV MET AND SHARP OPERATIONS & TOOL DEVE |
| IRS990/ContractorCompensationGrp/ServicesDesc | 2 | UNIVERSITY SEMICONDUCTOR RESEARCH |
| IRS990/ContractorCompensationGrp/ServicesDesc | 3 | EUV MET TOOL DEVELOPMENT |
| IRS990/ContractorCompensationGrp/ServicesDesc | 4 | UNIVERSITY SEMICONDUCTOR RESEARCH |
| IRS990/CreditCounselingInd | 0 | 0 |
| IRS990/CYBenefitsPaidToMembersAmt | 0 | 0 |
| IRS990/CYContributionsGrantsAmt | 0 | 453600 |
| IRS990/CYGrantsAndSimilarPaidAmt | 0 | 0 |
| IRS990/CYInvestmentIncomeAmt | 0 | 1624 |
| IRS990/CYOtherExpensesAmt | 0 | 37635467 |
| IRS990/CYOtherRevenueAmt | 0 | 345922 |
| IRS990/CYProgramServiceRevenueAmt | 0 | 47830979 |
| IRS990/CYRevenuesLessExpensesAmt | 0 | 4221097 |
| IRS990/CYSalariesCompEmpBnftPaidAmt | 0 | 6775561 |
| IRS990/CYTotalExpensesAmt | 0 | 44411028 |
| IRS990/CYTotalFundraisingExpenseAmt | 0 | 0 |
| IRS990/CYTotalProfFndrsngExpnsAmt | 0 | 0 |
| IRS990/CYTotalRevenueAmt | 0 | 48632125 |
| IRS990/DecisionsSubjectToApprovaInd | 0 | 0 |
| IRS990/DeductibleArtContributionInd | 0 | 0 |
| IRS990/DeductibleNonCashContriInd | 0 | 0 |
| IRS990/DeferredRevenueGrp/BOYAmt | 0 | 12904109 |
| IRS990/DeferredRevenueGrp/EOYAmt | 0 | 12375218 |
| IRS990/DelegationOfMgmtDutiesInd | 0 | 0 |
| IRS990/DepreciationDepletionGrp/TotalAmt | 0 | 822815 |
| IRS990/Desc | 0 | SEMATECH LED RESEARCH TO IMPROVE EUV THROUGHPUT AND RESIST PERFORMANCE USING NON-TRADITIONAL IMAGING MATERIALS WITH HIGH EUV ABSORBANCE AND NOVEL STRUCTURES, RESULTING IN NEW TECHNIQUES TO IMPROVE EUVL PERFORMANCE. BY INCORPORATING METAL OXIDE NANOPARTICLES - WITH A RESOLUTION DOSE THAT IS LESS THAN ONE FIFTH OF THAT NORMALLY USED WITH EUV SCANNER THROUGHPUT CALCULATIONS - RESEARCHERS WERE ABLE TO DEVELOP RESIST PLATFORMS WITH THE POTENTIAL TO SIGNIFICANTLY RELAX THE EUV SOURCE POWER REQUIREMENTS TO ENABLE HIGH-THROUGHPUT EUV LITHOGRAPHY. |
| IRS990/DescribedInSection501c3Ind | 0 | 0 |
| IRS990/DisregardedEntityInd | 0 | 1 |
| IRS990/DocumentRetentionPolicyInd | 0 | 1 |
| IRS990/DonorAdvisedFundInd | 0 | 0 |
| IRS990/ElectionOfBoardMembersInd | 0 | 1 |
| IRS990/EmployeeCnt | 0 | 91 |
| IRS990/EmploymentTaxReturnsFiledInd | 0 | 1 |
| IRS990/FamilyOrBusinessRlnInd | 0 | 0 |
| IRS990/FederalGrantAuditPerformedInd | 0 | 1 |
| IRS990/FederalGrantAuditRequiredInd | 0 | 1 |
| IRS990/FeesForServicesOtherGrp/TotalAmt | 0 | 1647529 |
| IRS990/ForeignActivitiesInd | 0 | 1 |
| IRS990/ForeignCountryCd | 0 | TW |
| IRS990/ForeignFinancialAccountInd | 0 | 1 |
| IRS990/ForeignOfficeInd | 0 | 1 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 0 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 1 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 2 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 3 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 4 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 5 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 6 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 7 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 8 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRltdOrgRt | 9 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 0 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 1 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 2 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 3 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 4 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 5 | 2.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 6 | 4.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 7 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 8 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 9 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 10 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 11 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 12 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 13 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 14 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 15 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/AverageHoursPerWeekRt | 16 | 40.00 |
| IRS990/Form990PartVIISectionAGrp/HighestCompensatedEmployeeInd | 0 | X |
| IRS990/Form990PartVIISectionAGrp/HighestCompensatedEmployeeInd | 1 | X |
| IRS990/Form990PartVIISectionAGrp/HighestCompensatedEmployeeInd | 2 | X |
| IRS990/Form990PartVIISectionAGrp/HighestCompensatedEmployeeInd | 3 | X |
| IRS990/Form990PartVIISectionAGrp/HighestCompensatedEmployeeInd | 4 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 0 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 1 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 2 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 3 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 4 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 5 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 6 | X |
| IRS990/Form990PartVIISectionAGrp/IndividualTrusteeOrDirectorInd | 7 | X |
| IRS990/Form990PartVIISectionAGrp/KeyEmployeeInd | 0 | X |
| IRS990/Form990PartVIISectionAGrp/OfficerInd | 0 | X |
| IRS990/Form990PartVIISectionAGrp/OfficerInd | 1 | X |
| IRS990/Form990PartVIISectionAGrp/OfficerInd | 2 | X |
| IRS990/Form990PartVIISectionAGrp/OfficerInd | 3 | X |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 0 | 0 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 1 | 0 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 2 | 0 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 3 | 0 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 4 | 0 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 5 | 0 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 6 | 0 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 7 | 36740 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 8 | 26628 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 9 | 16562 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 10 | 12034 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 11 | 37480 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 12 | 31891 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 13 | 31771 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 14 | 29871 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 15 | 27168 |
| IRS990/Form990PartVIISectionAGrp/OtherCompensationAmt | 16 | 13415 |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 0 | KALOYEROS ALAIN |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 1 | LIEHR MICHAEL |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 2 | BENNETT DAVID |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 3 | CADIGAN MICHAEL |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 4 | JOHNSTON STEVEN |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 5 | KANG HO-KYU |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 6 | ROZICH BILL |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 7 | GOLDBLATT RONALD |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 8 | HANSON SCOTT |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 9 | SAATHOFF DAVID D |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 10 | ARMBRUST DANIEL J |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 11 | BARFIELD RANDALL |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 12 | MCWILLIAMS SCOTT |
| IRS990/Form990PartVIISectionAGrp/PersonNm | 13 | HOBBS CHRISTOPHER C |
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| IRS990/MissionDesc | 0 | SEMATECH'S MISSION IS TO COOPERATIVELY SET GLOBAL INDUSTRY DIRECTION AND ACCELERATE TECHNOLOGY SOLUTIONS IN INFRASTRUCTURE, LITHOGRAPHY, MATERIALS AND MANUFACTURING, TO ENSURE A STRONG AND VIBRANT SEMICONDUCTOR INDUSTRY. A PRINCIPAL MEANS BY WHICH SEMATECH ACHIEVES ITS MISSION IS TO FUND RESEARCH AND DEVELOPMENT CONTRACTS IN THE VARIOUS AREAS OF ADVANCED SEMICONDUCTOR TECHNOLOGY. |
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| IRS990/ProgSrvcAccomActy2Grp/Desc | 0 | TECHNOLOGISTS AT SEMATECH DEPOSITED EUV MULTILAYERS WITH ZERO DEFECTS PER MASK AT 100 NM SENSITIVITY (SIO2 EQUIVALENT), DEMONSTRATING THE INDUSTRY'S FIRST DEFECT-FREE EUVL MASK BLANKS. IN ADDITION, BY SUBTRACTING OUT INCOMING SUBSTRATE DEFECTS, SEMATECH HAS DEMONSTRATED THAT THE MULTILAYER DEPOSITION PROCESS ITSELF CAN ACHIEVE ZERO DEFECTS DOWN TO 50 NM SENSITIVITY. ELIMINATING THESE LARGE "KILLER" DEFECTS IS ESSENTIAL FOR THE USE OF EUV IN EARLY PRODUCT DEVELOPMENT. |
| IRS990/ProgSrvcAccomActy3Grp/Desc | 0 | SEMATECH DEVELOPED AN EXPERIMENTALLY PROVEN EVALUATION METHOD THAT REDUCES THE AMOUNT OF TESTING OF COMMERCIAL EUV RESISTS FROM EVERY FORMULATION TO JUST THREE SAMPLES PER FAMILY. THE RESULTS CONFIRM THAT THE CONCENTRATION OF THE MAJOR COMPONENTS IN A RESIST CAN BE VARIED WITHOUT THE NEED FOR REQUALIFICATION. AS THE FIRST TO CERTIFY A RESIST FAMILY USING WITNESS SAMPLE-BASED RESIST OUTGAS TESTING, THIS ACHIEVEMENT HAS THE POTENTIAL TO REALIZE SUBSTANTIAL COST SAVINGS BY PROVIDING A SIGNIFICANT INCREASE (~20X) IN TESTING EFFICIENCY. |
| IRS990/ProgSrvcAccomActyOtherGrp/Desc | 0 | -SEMATECH CONTINUED TO SUPPLY EUV LITHOGRAPHY EXPOSURE CAPABILITY TO THE SEMICONDUCTOR INDUSTRY, PROVIDING MATERIALS SUPPLIERS ACCESS TO STATE-OF-THE-ART INTEGRATED SEMICONDUCTOR PROCESSING CAPABILITIES TO CONDUCT R&D ON THE MATERIALS NEEDED TO ADVANCE EUV PATTERNING. IN 2014 SEMATECH INVESTIGATED OVER 700 SAMPLES, LAUNCHING SEVERAL NEW CLASSES OF EUVL RESIST MATERIALS, INCLUDING ORGANO METALLIC RESISTS, NANOPARTICLE RESISTS, AND NEGATIVE TONE RESISTS.-SEMATECH'S EUVL MASK INFRASTRUCTURE INITIATIVE - WHICH WAS CONCEIVED BY INDUSTRY PARTNERS (INCLUDING INTEL, SAMSUNG, GLOBALFOUNDRIES, TSMC AND SK HYNIX) FOR THE DEVELOPMENT OF AN EUV AERIAL IMAGE METROLOGY SYSTEM - COMPLETED THE ASSEMBLY OF PROTOTYPE ACTINIC REVIEW TOOL MANUFACTURED BY ZEISS AND PROVIDED INITIAL IMAGING RESULTS MEETING PRODUCTION NEEDS. ACTINIC REVIEW OF POTENTIAL DEFECT SITES IS REQUIRED FOR THE PRODUCTION OF DEFECT-FREE MASKS; WITHOUT SUCH A REVIEW IT IS DIFFICULT TO DETERMINE TO WHAT EXTENT PRINTED DEFECTS NEED TO BE REPAIRED OR COMPENSATED. IT ALSO SERVES AS VERIFICATION FOR THE REPAIR OR COMPENSATION.-SEMATECH AND ZEISS PARTNERED TO DEVELOP A MASSIVELY PARALLEL E-BEAM INSPECTION SOLUTION BASED ON MULTIBEAM CORE TECHNOLOGY, WHICH OFFERS BOTH HIGH THROUGHPUT AND HIGH-SENSITIVITY PERFORMANCE. ELECTRON-OPTICAL AND IMAGING PERFORMANCE EVALUATIONS ON THE 61 BEAM DEMONSTRATION SYSTEM, AS WELL AS DEFECT SENSITIVITY ANALYSES ON 15 NM AND 28 NM HALF-PITCH PATTERNS, INDICATE THAT THE TECHNOLOGY HAS THE POTENTIAL TO SCALE TOWARD MEETING INSPECTION REQUIREMENTS FOR SUB-10 NM HIGH-VOLUME MANUFACTURING.-SEMATECH'S MANUFACTURING ORGANIZATION FACILITATED SHARED LEARNING AMONG MEMBERS OF TESTED METHODS TO REDUCE THE UTILIZATION OF COSTLY CONSUMABLES, EFFORTS TO IMPROVE THE EFFICIENCY OF PREVENTIVE MAINTENANCE PROCEDURES ON HIGH-VALUE PROCESS EQUIPMENT, AND YIELD-ENHANCEMENT METHODS. THE COMPUTED VALUE PROVIDED BY THIS PROGRAM, USING METRICS AGREED UPON BY THE INDUSTRY PARTICIPANTS, WAS AROUND $3.7M FOR 2014.-SEMATECH'S ENVIRONMENTAL SAFETY AND HEALTH GROUP PROVIDED DETAILED CHARACTERIZATION OF THE PARTITIONING OF ARSENIC (A TOXIC ELEMENT) IN THE WASTE THAT IS GENERATED BY THE CHEMICAL MECHANICAL PLANARIZATION (CMP) PROCESS. THE DEVELOPMENT OF THIS FUNDAMENTAL DATA IS ESSENTIAL FOR BASIC DESIGN AND SELECTION OF WASTEWATER TREATMENT TECHNOLOGY FOR ADOPTING EMERGING MATERIALS SUCH AS ARSENIC IN HIGH-VOLUME SEMICONDUCTOR MANUFACTURING.-SEMATECH, ALONG WITH APPLIED MATERIALS, DEMONSTRATED WORLD-CLASS RESULTS ON THE ELIMINATION OF ION-IMPLANTATION INDUCED DAMAGE IN III-V FIN STRUCTURES THROUGH THE USE OF THERMAL PROCESSES DURING IMPLANTATION.-SEMATECH, ALONG WITH AIXTRON, ACHIEVED WORLD-CLASS RESULTS ON THE EPITAXIAL GROWTH OF SEVERAL III-V HETEROSTRUCTURES ON 300 MM SI BY MOCVD, DEMONSTRATING THE POTENTIAL TO COMBINE THE SUPERIOR ELECTRONIC AND OPTOELECTRONIC PROPERTIES OF III-VS WITH THE HIGH MANUFACTURABILITY OF SI-BASED MICROELECTRONICS. -SEMATECH PARTNERED WITH PENN STATE TO DEVELOP THE FERROELECTRIC STRUCTURES THAT COULD BE ADVANTAGEOUSLY UTILIZED IN ULTRA-LOW-POWER TRANSISTORS THAT HELP ENABLE THE 'INTERNET OF THINGS' AND IMPROVE THE ENVIRONMENTAL FRIENDLINESS OF BOTH INDUSTRIAL DATA-CENTERS AND CONSUMER ELECTRONICS.-SEMATECH PARTNERED WITH PURDUE TO DEVELOP AND CHARACTERIZE DOPING TECHNIQUES THAT IMPROVE THE ELECTRICAL CONDUCTIVITY OF TWO-DIMENSIONAL TRANSITION DICHALCOGENIDE MATERIALS SUCH AS MOS2. TWO-DIMENSIONAL MATERIALS WILL LIKELY BE REQUIRED TO REPLACE TRADITIONAL BULK MATERIALS, SUCH AS SILICON, WHICH MAY FAIL WHEN TRANSISTOR TECHNOLOGY IS SCALED TO THE 5NM AND 3NM NODES.-SEMATECH AND SCREEN SEMICONDUCTOR SOLUTIONS CO., LTD. SUCCESSFULLY REVEALED THE FIRST 300 MM WAFER-LEVEL DEMONSTRATION OF ALTERNATIVE DOPING USING LIQUID PHASE MONOLAYER DOPING (MLD) ON III-V SUBSTRATES. MLD TECHNOLOGY OFFERS THE POTENTIAL TO ENABLE SUB-10 NM NODE SCALING FOR DOPING AND ADDRESSES CONCERNS REGARDING THE CONFORMITY AND MATERIAL DAMAGE TO HIGH-MOBILITY MATERIALS SUCH AS GE AND III-V. |
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| IRS990ScheduleD/SupplementalInformationDetail/ExplanationTxt | 0 | THE COMPANY FOLLOWS THE GUIDANCE FOR UNCERTAINTY IN INCOME TAXES. AS OF DECEMBER 31, 2014, THE COMPANY BELIEVES THAT IT HAS APPROPRIATE SUPPORT FOR THE INCOME TAX POSITIONS TAKEN AND TO BE TAKEN ON ITS RETURNS BASED ON AN ASSESSMENT OF MANY FACTORS INCLUDING EXPERIENCE AND INTERPRETATIONS OF TAX LAWS APPLIED TO THE FACTS OF EACH MATTER. THE COMPANY HAS CONCLUDED THAT THERE ARE NO SIGNIFICANT UNCERTAIN TAX POSITIONS REQUIRING DISCLOSURE, AND THERE ARE NO MATERIAL AMOUNTS OF UNRECOGNIZED TAX BENEFITS. THE COMPANY IS NO LONGER SUBJECT TO FEDERAL, STATE, OR LOCAL INCOME TAX EXAMINATION BY TAX AUTHORITIES FOR YEARS BEFORE 2011. |
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Displayed year
2014 • Form 990Detailed filing. Detailed filing data is available for this year.